MATERIAL FOR FORMING RESIST PROTECTIVE FILM AND RESIST PATTERN FORMING METHOD USING SAME

摘要

PROBLEM TO BE SOLVED: To provide a material for forming a resist protective film which simultaneously prevents deterioration in a resist film during liquid immersion lithography using water or other various liquids for liquid immersion lithography and deterioration in the liquid itself for liquid immersion lithography used in a liquid immersion lithography process, does not increase the number of processing steps, and improves the post exposure time delay resistance of the resist film.

SOLUTION: The material for forming a resist protective film contains at least an acrylic polymer having at least a constitutional unit represented by formula (1) (where R1is a 1-5C linear or branched alkylene, and R2is a 1-15C linear or branched alkyl or a hydrocarbon group having an alicyclic structure) and a solvent.

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