发明名称 CHARGED PARTICLE BEAM DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a charged particle beam device without requiring a high-voltage cable and advantageous in vibration-resistance performance. SOLUTION: This charged particle beam device is provided with: a charged particle beam generation source for generating a charged particle beam; a sample base for processing used for mounting a sample irradiated with the charged particle beam; a high-voltage power source for charged particle beam generation for applying an acceleration voltage to the charged particle beam generation source; and a deceleration means for applying, to the sample base for processing, a deceleration voltage for reducing the irradiation speed of the charged particle beam radiated to the sample. The charged particle beam device is characterized by that the deceleration means includes a a boosting power source part and an external power source part for low-voltage supply; and the boosting power source part is installed on the sample base for processing. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006185661(A) 申请公布日期 2006.07.13
申请号 JP20040375976 申请日期 2004.12.27
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 SASAKI MASAJI;ONISHI TAKESHI
分类号 H01J37/317;H01J37/28 主分类号 H01J37/317
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