发明名称 SUBSTRATE TREATMENT DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a substrate treatment device capable of reducing a treatment time required for one substrate and reducing a treatment cost. SOLUTION: This treatment device 21 has a chamber 21a capable of being evacuated, and has a first movable shelf 31, a second movable shelf 32 and a third movable shelf 33 all which are vertically movable in the chamber. The first to the third shelves 31-33 have structures capable of being stacked in a nesting form; a plurality of the movable shelves in a state that substrates are mounted in a housing position above a mounting position facing a shutter S can be stacked and housed; and the plurality of movable shelves can be stacked and evacuated at an evacuation position below the mounting position. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006185704(A) 申请公布日期 2006.07.13
申请号 JP20040376898 申请日期 2004.12.27
申请人 TOSHIBA CORP 发明人 FURUYA MASAAKI;KOBAYASHI HIROAKI;SUZUKI YUJI
分类号 H01J9/24;B65G49/00;B65G49/06;H01L21/677 主分类号 H01J9/24
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