| 摘要 |
PROBLEM TO BE SOLVED: To provide a device and method for defect inspection for simply and rapidly extracting an object defect to be observed. SOLUTION: A GUI image plane 13 is equipped with a wafer map 15 with a defect display for defect information, a figure designating part 16 for selecting a figure to determine a desired domain for setting an observation area, an inspecting object defect setting part 17 for selecting whether or not the inside of the determined domain is used as the observation area, and an area priority setting part 22 for selecting an area priority ranking method in order to select any one domain for the observation area, for example, if overlapping portions exist among a plurality of domains 18, 20, and 21. COPYRIGHT: (C)2006,JPO&NCIPI
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