SILICON-CONTAINING PHOTOSENSITIVE COMPOSITION, METHOD FOR FORMING THIN FILM PATTERN USING SAME, PROTECTIVE FILM FOR ELECTRONIC DEVICE, GATE INSULATING FILM AND THIN FILM TRANSISTOR

摘要

Disclosed is a photosensitive composition having photosensitivity which is alkaline developable without containing a crosslinking agent. Specifically disclosed is a silicon-containing photosensitive composition characterized by containing a silicon-containing polymer including at least one polymer (A1) represented by the general formula (1) below, wherein at least one of R<SUB>11</SUB>-R<SUB>1n</SUB> is an H and the rest of them are organic groups, or at least one polymer (A1) and one polymer (A2) represented by the general formula (2) below, and a compound (B) which generates an acid or a base when irradiated with an active ray or radiation ray. POLYMER (A1) (1) (In the formula, at least one of R<SUB>11</SUB>-R<SUB>1n</SUB> represents an H, and n represents an integer of 1 or more.) POLYMER (A2) (2) (In the formula, R<SUB>21</SUB>-R<SUB>2n</SUB> represent atoms other than H or functional groups, and n represents an integer of 1 or more.)