| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a data structure in which a load for preparing a program used in a substrate treatment equipment can be reduced and the data management can be easily performed, etc. <P>SOLUTION: The data structure of data used in an exposure apparatus for exposing a shot area of a wafer through a reticle is sectioned into a reticle data section SE1 storing data of reticles and a wafer fundamental data section SE2 storing data of a wafer, a wafer map layout SE3 storing data of the arrangement of a shot area, an exposure shot layout SE4 storing data of an inside composition, an alignment mark parameter SE5 storing data for marks of wafers and data of its measurement condition, a measurement parameter SE6, an in-exposure correction parameter SE7 storing data of in-exposure correction treatment and an exposure process, and a sequence parameter SE8. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
