发明名称 DETECTION DEVICE, DETECTION METHOD AND EXPOSURE APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a detection device, a detection method and an exposure apparatus which do not require re-computing or re-input of an alignment mark, even when an alignment mark can not be acquired at a theoretical position of the alignment mark during imaging an alignment mark for aligning in a step of forming a circuit pattern on a photosensitive material, and thereby, operating properties are improved and the time required for alignment is reduced. <P>SOLUTION: Image data possessed by an image data supply source are browsed; desired image data are acquired from the image data supply source; the obtained image data are subjected to predetermined image processing; and the processed image data are stored in a predetermined storing means. Desired processed image data are read out from the storage means storing one or more processed image data, and an image is formed on a recording medium. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006184466(A) 申请公布日期 2006.07.13
申请号 JP20040376834 申请日期 2004.12.27
申请人 FUJI PHOTO FILM CO LTD 发明人 KITAGAWA TOMOYA;MORITA KIYOTERU
分类号 G03F7/207;G03F7/20 主分类号 G03F7/207
代理机构 代理人
主权项
地址