| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a multilayer film reflection mirror having the desired multilayer film period length, and its manufacturing apparatus (a film deposition apparatus). <P>SOLUTION: Contribution of an inner surface of an aperture as a shielding part is d×sinθ, where d denotes the thickness of a film thickness correction plate, and θ denotes an angle of inclination. When the thickness is 0.5 mm, and the film thickness correction plate is inclined by 30°, the aperture ratio is reduced to about 71% compared with a case in which the film thickness correction plate is not inclined. When the thickness is reduced to 0.4 mm by grinding a part of the film thickness correction plate, the reduction range of the aperture ratio is reduced and the aperture ratio is reduced to about 77% compared with a case in which the film thickness correction plate is not inclined. The thickness of a center portion is 0.5 mm, the thickness is gradually reduced toward a peripheral part, and if the thickness is 0.4 mm in an outermost peripheral part, the film thickness correction plate is inclined by 30°, film deposition can be performed while the aperture ratio of the peripheral part is larger by about 8% than that of the peripheral part. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
