A METAL OXIDATION ALLOY LAYER, METHOD OF MANUFACTURING A METAL OXIDATION ALLOY LAYER, AND METHOD OF MANUFACTURING A GATE STRUCTURE AND A CAPACITOR USING THE SAME,申请号KR20050002168-传众专利搜索

发明名称	A METAL OXIDATION ALLOY LAYER, METHOD OF MANUFACTURING A METAL OXIDATION ALLOY LAYER, AND METHOD OF MANUFACTURING A GATE STRUCTURE AND A CAPACITOR USING THE SAME
摘要
申请公布号	KR20060081764(A)	申请公布日期	2006.07.13
申请号	KR20050002168	申请日期	2005.01.10
申请人	SAMSUNG ELECTRONICS CO., LTD.	发明人	LEE, JUNG HO;CHOI, JUNG SIK;CHO, JUN HYUN;EOM, TAE MIN;LEE, JI HYUN
分类号	H01L21/336;H01L21/8242	主分类号	H01L21/336
代理机构		代理人
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