发明名称 LIQUID SUPPLY DEVICE, SUBSTRATE PROCESSING APPARATUS AND LIQUID SUPPLY METHOD
摘要 PROBLEM TO BE SOLVED: To supply micro-flow liquid while controlling the flow rate with high accuracy. SOLUTION: The liquid supply device 1 has a pump mechanism 13 for sending out liquid to a flow path 11, a flowmeter 14 for measuring the flow rate per unit time of liquid flowing through the flow path 11, and a controller 15 for controlling these mechanisms. The pump mechanism 13 has a variable container 131 made of deformable resin, a pressure resistant container 132 for storing the variable container 131 inside, and an electropneumatic regulator 133 for adjusting pressure between the pressure resistant container 132 and variable container 131. The variable container 131 has a bellows 1311. The liquid supply device 1 can supply the micro-flow liquid while controlling the flow rate with high accuracy, by that the pressure applied to the variable container 131 is controlled by the controller 15 on the basis of the liquid flow rate measured by the flowmeter 14 while the liquid in the variable container 131 is sent out into the flow path 11 by applying pressure to the variable container 131 of the pump mechanism 13. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006184989(A) 申请公布日期 2006.07.13
申请号 JP20040375294 申请日期 2004.12.27
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 MIZOHATA YASUHIRO
分类号 G05D7/06;G01F1/48;H01L21/306 主分类号 G05D7/06
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