发明名称 Method of producing polishing pad
摘要 A method of manufacturing a grooved polishing pad wherein a large number of grooves, extending parallel to each other, are fabricated at specific intervals on at least one of a front surface and a back surface of a polishing pad substrate through a groove cutting process on the polishing pad substrate which is made from a synthetic resin material, the method comprising the steps of: cutting, by using a multi-edged tool having a plurality of pad groove machining cutting parts, arrayed at equal spacing p with the spacing p being an integer multiple no less than 2 of a desired spacing d of the grooves, a plurality of the grooves; and repeating the cutting of the plurality of grooves through shifting the multi-edged tool in a direction in which the pad groove machining cutting parts are arrayed, in order to fabricate the large number of grooves, extending parallel to each other, with the desired spacing d.
申请公布号 US2006154577(A1) 申请公布日期 2006.07.13
申请号 US20050301361 申请日期 2005.12.12
申请人 发明人 SUZUKI TATSUTOSHI
分类号 B24B1/00 主分类号 B24B1/00
代理机构 代理人
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