| 摘要 |
PROBLEM TO BE SOLVED: To form a thin film of uniform thickness and quality efficiently on a substrate without increase in material cost and size in a vapor phase deposition device. SOLUTION: The vapor deposition device comprises a reactive tube 4 in which material gas passes, and a substrate holder 6 which holds a substrate 5 so that the surface of the substrate 5 which is to be treated is exposed inside the reactive tube 4. Regarding the length of traversal plane profile in the direction vertical to the surface of the substrate 5 when the internal space of the reactive tube 4 is cut by a plane penetrating the center of substrate 5, the length at both ends of the side in the reactive tube 4 is larger than that at the center of the reactive tube 4. COPYRIGHT: (C)2006,JPO&NCIPI
|
