发明名称 CHEMICAL MECHANICAL POLISHING PAD DRESSER
摘要 <p>CMP pad dressers and their methods of manufacture are disclosed. One aspect of the present invention provides a CMP pad dresser (20) having improved superabrasive grit retention in a resin layer. The CMP pad includes a resin layer (14), superabrasive grit (12) held in the resin layer (14) such that an exposed portion (26) of each superabrasive grit (12) protrudes from the resin layer (14), and a metal coating layer (16) disposed between each superabrasive grit (12) and the resin layer (14), where the exposed portions (26) are substantially free of the metal coating layer (16). The metal coating layer (16) acts to increase the retention of the superabrasive grit (12) in the resin layer (14) as compared to superabrasive grit (12) absent the metal coating layer (16).</p>
申请公布号 WO2006073924(A2) 申请公布日期 2006.07.13
申请号 WO2005US47024 申请日期 2005.12.23
申请人 SUNG, CHIEN-MIN 发明人 SUNG, CHIEN-MIN
分类号 C09K3/14;B24D99/00 主分类号 C09K3/14
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