| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma device capable of uniformly generating plasma in a reaction space, and achieving long life of components constituting a chamber. <P>SOLUTION: An upper part of a cylinder-shaped chamber 11 having a closed bottom face is sealed by a suitably thin conductor plate 31. The conductor plate 31 is electrically separated from a side wall of the chamber 11 by an insulation part 41. A coil 21 is arranged above the conductor plate 31 coaxially with the chamber 11. A substrate 61 to be treated is laid on the bottom face of the chamber 11. A sufficiently strong variable magnetic field penetrates through the reaction space in the chamber 11 through the conductor plate 31 to generate the plasma in the reaction space. At the same time, while the plasma is generated, the conductor plate 31, especially, a whole inner surface facing the reaction space, is kept at an equipotential surface. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
