| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide capacitive micromachined ultrasound transducer (cMUT) and method of manufacturing the same. <P>SOLUTION: A capacitive micromachined ultrasound transducer (cMUT) cell (10) is provided. This cMUT cell (10) includes a lower electrode (18). Furthermore, the cMUT cell (10) includes a diaphragm (22) disposed adjacent to the lower electrode (18) such that a gap having a first gap width is formed between the diaphragm and the lower electrode (18), wherein the diaphragm (22) comprises one of a first epitaxial layer (40) or a first polysilicon layer. In addition, a stress reducing material is disposed in the first epitaxial layer (40). <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |
