发明名称 METHOD FOR MANUFACTURING DIFFRACTION GRATING
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing a diffraction grating capable of fining its surface roughness and increasing its size. SOLUTION: In an apparatus for manufacturing the diffraction grating, an ion source 4 of applying ion beams, a target material 2 irradiated with ions so as to be sputtered, and a substrate 1 on which atoms driven away from the target material 2 are deposited are installed, and a mask 3 is arranged between the target material 2 and the substrate 1. A silicon dioxide material is used for the target material 2. The mask 3 is manufactured so as to be one size larger than the substrate 1, and its surface is provided with slits 16 as transmission parts so as to be a grating shape. The slits 16 are worked matching the number of grooves in the diffraction grating. The mask 3 is fitted to a mask holder 7 inserted into a guide bar 6 fixed to a guide bar holder 12 vertically movably. The right edge of the mask holder 7 is integrated with a ball screw movable part 8 screwed with the threaded rod 9, and the threaded rod 9 is connected with a pulse motor 10 fixed to a motor holder 11. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006183111(A) 申请公布日期 2006.07.13
申请号 JP20040379981 申请日期 2004.12.28
申请人 SHIMADZU CORP 发明人 FURUKAWA YASUYUKI
分类号 C23C14/04;G02B5/18 主分类号 C23C14/04
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