发明名称 Imprint lithography
摘要 An imprinting method is disclosed which involves irradiating a photo-curable imprintable medium in a flowable state on a substrate with radiation to initiate curing of the medium, after the irradiating, contacting the medium with a template to form an imprint in the medium, allowing the medium to substantially cure such that the medium is in a substantially non-flowable state while the medium is contacted by the template, and separating the template from the medium while the medium is in the substantially non-flowable state.
申请公布号 US2006154179(A1) 申请公布日期 2006.07.13
申请号 US20050030326 申请日期 2005.01.07
申请人 KONINKLIJKE PHILIPS ELECTRONICS N.V. 发明人 VAN SANTEN HELMAR;KOLESNYCHENKO ALEKSEY Y.;NEIJZEN JACOBUS H.M.;VERSTEGEN EMILE
分类号 G03C5/00 主分类号 G03C5/00
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