发明名称 |
Focusing apparatus and lithography system using the same |
摘要 |
A focusing apparatus and a lithography system using the same capable of adjusting a uniformity of an electromagnetic field by moving a portion of a magnetic field generator. The focusing apparatus may control a path of an electron beam generated from an electron-beam emitter of the lithography system. In the focusing apparatus, a uniformity of the magnetic field in the vacuum chamber may be adjusted through movement of the portion of the magnetic field generator with respect to the vacuum chamber.
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申请公布号 |
US2006151712(A1) |
申请公布日期 |
2006.07.13 |
申请号 |
US20050311282 |
申请日期 |
2005.12.20 |
申请人 |
MOON CHANG-WOOK;KIM DONG-SOO;SONG MYUNG-GON;LEE SEUNG-WOON;OH YUN-SANG |
发明人 |
MOON CHANG-WOOK;KIM DONG-SOO;SONG MYUNG-GON;LEE SEUNG-WOON;OH YUN-SANG |
分类号 |
H01J1/50 |
主分类号 |
H01J1/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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