| 摘要 |
The invention relates to a method for producing a large variety of photoresist structures, wherein a volume of photosensitive material ( 5 ) is exposed at least once by means of at least two light beams ( 1, 2 ), which are superposed inside the photosensitive material ( 5 ), and is subsequently subjected to a developing process, wherein the light beams ( 1, 2 ) penetrate at least one transparent optical element ( 3 ). The optical element ( 3 ) is a polyhedron with planar or curved surfaces which largely prevents refraction of the light beams on the surface of the volume of photosensitive material ( 5 ) when the beams are fed-in and/or fed-out of the volume of photosensitive material ( 5 ), so that the angle of refraction for the light beams ( 1, 2 ) can be greater in the volume of photosensitive material ( 5 ) than the critical angle of the total reflection, which has a limiting effect without optical element ( 3 ).
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