LITHOGRAPHY APPARATUS, ILLUMINATION SYSTEM, AND DEBRIS TRAPPING SYSTEM

摘要

PROBLEM TO BE SOLVED: To provide a debris trapping system that allows for a high pressure of a buffer gas in relation to a source gas to enhance the probability that the debris particles are trapped by the system while simultaneously allowing for high transmission of radiation through the system.

SOLUTION: A debris trapping system for trapping debris particles released with the generation of radiation by a radiation source in a lithography apparatus includes first and second sets of channels. Each channel of the first set enables radiation from a radiating source to propagate therethrough, and has an inner wall for catching debris particles. The second set of channels is situated downstream of the first set with respect to a propagation direction of the radiation. Each channel of the second set enables radiation from the radiating source to also propagate therethrough and has an inner wall for catching debris particles. A gas supply and a gas exhaust are configured to provide between the first set and the second set of channels a gas flow having a net flow direction substantially across the propagation direction of the radiation from a radiating source.

COPYRIGHT: (C)2006,JPO&NCIPI