发明名称 IMAGING OPTICS, EXPOSURE APPARATUS AND METHOD FOR MANUFACTURING MICRODEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide imaging optics in which color aberration is favorably corrected even for light in a wavelength region including j-line (at 313 nm). <P>SOLUTION: The imaging optics K1, K2 for imaging an image on a first plane M onto a second plane P include at least three combinations of: first transmissive optical members G1, G3, G7 comprising a fluoride: and second transmissive optical members G2, G4, G8 disposed adjacent to the first transmissive optical members G1, G3, G7, respectively and having different dispersions from those of the first optical members G1, G3, G7. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006184709(A) 申请公布日期 2006.07.13
申请号 JP20040379611 申请日期 2004.12.28
申请人 NIKON CORP 发明人 HATADA HITOSHI
分类号 G03F7/20;G02B13/14;G02B13/24;G02B17/08;H01L21/027 主分类号 G03F7/20
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