发明名称 ALIGNMENT ADJUSTMENT METHOD, METHOD FOR FORMING ALIGNMENT MARK, BASE MATERIAL, AND METHOD FOR MANUFACTURING TRANSMISSIVE OPTICAL ELEMENT
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for forming an alignment mark that is effective for obtaining high accuracy of alignment between top and back surfaces of a base material transparent at a specified wavelength, and to provide a method for manufacturing a transmissive optical element for manufacturing a high-performance transmissive optical element. <P>SOLUTION: The method includes steps of: (S11 to S16) forming alignment marks for aligning top and back surfaces of a base material on the top and back surfaces of the substrate; (S17) acquiring information about a misalignment degree between alignment marks on the top and back surfaces through either the top or the back surface of the base material after forming the alignment marks; and adjusting the alignment of an optical plane to be formed on the top and back surfaces of the base material according to the information about the misalignment degree. Thus, by using transparency of the base material at a specified wavelength for preliminarily obtaining information about an formation error between alignment marks on the top and back surfaces with high accuracy, the alignment marks are effective to increase the accuracy of alignment between the top and back surfaces of the transparent base material. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006184889(A) 申请公布日期 2006.07.13
申请号 JP20050345391 申请日期 2005.11.30
申请人 NIKON CORP 发明人 KIKUCHI HIROFUMI;NAKAJIMA KENJI;OKANO YUJI
分类号 G03F9/00;G02B3/00 主分类号 G03F9/00
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