| 摘要 |
PROBLEM TO BE SOLVED: To provide a system for measuring near-field film thickness, having ample film-thickness measurement accuracy, with spatial resolution of wavelength or smaller of light. SOLUTION: The near-field film-thickness measuring system 10 comprises a scattering near field probe 12; a light irradiation means 14 for irradiating excitated light generating near-field light on the edge of the near-field probe and/or a film sample face; a detection means 18 for detecting, by condensing the scattered light generated by approaching the edge of the near-field probe and the film sample face in a near-field region as measurement light; a spectral means 16 for performing spectral measurement in a prescribed wave number region, being installed on an optical path between the light irradiation means and the detection means; and a film-thickness calculation means 20 for calculating the film-thickness of a film sample, on the basis of spectral information obtained from the measurement light detected by the detection means. COPYRIGHT: (C)2006,JPO&NCIPI |
