METHOD AND APPARATUS OF DRY ETCHING

摘要

PROBLEM TO BE SOLVED: To monitor the generation of a black silicon and its signs in dry etching of a substrate which consists of a silicon series material. SOLUTION: A dry etching apparatus 11 includes a coil 36 for generating a plasma in a vacuum container 12, and a camera 45 which photoes the image of the surface to be etched of the substrate (1) which generates the plasma and is under processing by dry etching. A controller 55 has a monitoring unit 57 for generating the black silicon or its signs based on the image which the camera 45 photoed. COPYRIGHT: (C)2006,JPO&NCIPI