发明名称 |
Ion gun deposition and alignment for liquid-crystal applications |
摘要 |
An apparatus for depositing and aligning an amorphous film in a single step, a method of forming an aligned film on a substrate in a single step by combining the deposition and alignment of an alignment layer into a single-step using ion beam processing and an amorphous film having an aligned atomic structure prepared by a method in which an aligned film is deposited and aligned in a single step are provided. The film is deposited and aligned in a single step by bombarding a substrate with an ion beam at a designated incident angle to simultaneously (a) deposit the film onto the substrate and (b) arrange an atomic structure of the film in at least one predetermined aligned direction.
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申请公布号 |
US2006150912(A1) |
申请公布日期 |
2006.07.13 |
申请号 |
US20060371551 |
申请日期 |
2006.03.09 |
申请人 |
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发明人 |
CALLEGARI ALESSANDRO C.;CHAUDHARI PRAVEEN;DOYLE JAMES P.;GALLIGAN EILEEN A.;KATO YOSHIMINE;LACEY JAMES A.;LIEN SHUI-CHIH A.;LU MINHUA;NAKANO HIROKI;ODAHARA SHUICHI |
分类号 |
C23C16/00 |
主分类号 |
C23C16/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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