| 摘要 |
<P>PROBLEM TO BE SOLVED: To perform light intensity detection for exposure control without the need for installing a half mirror for splitting illumination light in an exposure apparatus used for lithography for semiconductor integrated circuits, etc. <P>SOLUTION: The exposure apparatus includes an exposure region specifying member for specifying an exposure region of exposure light irradiated onto a sensitive substrate such as a wafer or the like to transfer a pattern formed on a reticle onto the sensitive substrate. In the exposure apparatus, there is disposed a light receiving element on the exposure region specifying member for detecting light. Further, the exposure region specifying member includes a movable blind for arbitrarily altering the exposure region. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
