LITHOGRAPHY APPARATUS AND DEVICE MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a lithography apparatus and device manufacturing method that improves handling of regions prone to excess exposed-spot overlap.

SOLUTION: The lithography apparatus is provided with an array of individually controllable elements configured to modulate sub-beams of radiation and a data path that includes at least one data manipulation device arranged to at least partly convert data defining a requested pattern to a control signal suitable for controlling the array of individually controllable elements to form substantially the requested pattern on the substrate. The data manipulation device is arranged to carry out the conversion by applying a pseudo-inverted form of a point-spread function matrix to a column vector representing the requested pattern. The point-spread function matrix includes information about the shape and relative position of the point-spread function of each irradiated spot to be exposed on the substrate by one of the sub-beams of radiation at a given time.

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