发明名称 PROCESSOR
摘要 PROBLEM TO BE SOLVED: To evenly get a treated gas across the whole area of a substrate to be processed that is mounted on a substrate mounting platform, and control the heat transfer coefficient between the substrate and the substrate mounting platform, thus making the temperature of the substrate uniform across its whole surface. SOLUTION: A carbon material 4 is used as a porous material having many continuous small holes for a substrate mounting platform 1 on which a substrate 12 to be processed is controlled under a specified temperature, the substrate mounted on it and arranged in a vacuum vessel 2. The porous carbon material 4 has many continuous holes formed in every direction in a carbon substrate, and a gas 9 for treatment passes through these continuous holes spreading evenly from the lower side and blowing out to the upper side. An electrostatic zipping electrode 5 is buried in the porous carbon substrate 4, and the outer periphery of this electrostatic zipping electrode 5 and porous carbon substrate 4 is covered by a thermostable insulating film 8 of ceramics and the like. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006186314(A) 申请公布日期 2006.07.13
申请号 JP20050301722 申请日期 2005.10.17
申请人 FUTURE VISION:KK 发明人 IWABUCHI KATSUHIKO;KOBAYASHI SATOKI
分类号 H01L21/683 主分类号 H01L21/683
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