| 摘要 |
PROBLEM TO BE SOLVED: To provide a patterning apparatus to be used in patterning processing having a high degree of freedom. SOLUTION: The patterning apparatus has a vacuum chamber adjustable in pressure, a nozzle connected to a material feeding source and also arranged in the vacuum chamber, into which a material from the material feeding source is fed, and a substrate stage arranged in the vacuum chamber for holding and fixing a substrate. COPYRIGHT: (C)2006,JPO&NCIPI
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