发明名称 LEVEL SENSOR, LITHOGRAPHIC DEVICE AND DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a level sensor which is used to measure the height of a substrate in a lithographic projection device, can be also used for a single-stage immersion lithographic device, has no process dependency, is of high reaction rate, and is of a kind different from a conventional type. <P>SOLUTION: The level sensor includes a transmitter 10 and a receiver 11. The transmitter is configured to transmit a pressure wave 100 to a predetermined position on the surface of a substrate between the substrate W and a projection system PS, and to allow the substrate W to reflect at least a part of the pressure wave. The receiver receives at least a part of the reflected wave. The level sensor is configured to determine the height of the surface in the substrate W based on the pressure wave transmitted and received. The level sensor can be used for immersion process, quickly works and has a scarce process dependency, because the pressure wave is used. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006186287(A) 申请公布日期 2006.07.13
申请号 JP20040382894 申请日期 2004.12.27
申请人 ASML NETHERLANDS BV 发明人 BRUINSMA ANASTASIUS JACOBUS ANICETUS;STAALS FRANK;VAN WIJK ROBERT JAN;NIHTIANOV STOYAN
分类号 H01L21/027;G01B17/00;G03F9/02 主分类号 H01L21/027
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