发明名称 PATTERN DRAWING DEVICE, PATTERN DRAWING METHOD, MANUFACTURING METHOD OF ORIGINAL MOLD FOR MANUFACTURING INFORMATION RECORDING MEDIUM, AND MANUFACTURING METHOD OF INFORMATION RECORDING MEDIUM
摘要 PROBLEM TO BE SOLVED: To reduce the cost of manufacturing an information recording medium by carrying out partial drawing processing, and drawing position changing processing in which a drawing position is changed alternately a plurality of times, and drawing an exposure pattern onto a resin layer. SOLUTION: A pattern drawing device is composed so that an exposure pattern P can be drawn for forming a concave-convex pattern for manufacturing an information recording medium. A beam output is composed so that an electronic beam EB can be outputted of which effective drawing width is smaller than the width and the length of each pattern PSO. A control unit performs processing of drawing the pattern PSO by controlling the beam output to make it output the electronic beam EB, and controlling a beam deflector to make the electronic beam EB reciprocate in the widthwise direction of the pattern PSO to be drawn after waiting for a predetermined time t1w, when a standard signal S1 generated by a standard signal generator, based on either an internal signal generated inside a rotational mechanism that rotates the substrate or a rotation driving signal to the rotational mechanism so as to synchronize with the rotation of a substrate is outputted, and draws the exposure pattern P. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006184924(A) 申请公布日期 2006.07.13
申请号 JP20060033139 申请日期 2006.02.10
申请人 TDK CORP 发明人 SOENO KEIICHI
分类号 G03F7/20;G11B5/84;G11B5/86;G11B7/26 主分类号 G03F7/20
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