| 摘要 |
The exposure apparatus of the invention includes a chamber 1 housing an exposure apparatus body 6 provided with an illumination optical system 2 , a reticle 3 , a projection lens 4 and a stage 5 , gas supply units 7, 13, 17 and 18 that are disposed in the chamber 1 and supply gas taken in from the outside of the chamber 1 to the vicinities of the reticle 3 and stage 5 and a wet filter 10 which is disposed in the vicinity of a gas intake 8 from which the gas is supplied to the gas supply units 7, 13, 17 and 18 and forms a water film through which the gas passes.
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