Pattern formation method, method for manufacturing color filter, color filter, method for manufacturing electro-optical device, and electro-optical device

摘要

A pattern formation method includes: forming on a pattern formation surface a barrier for forming a pattern; and discharging in a pattern formation region bounded by the barrier droplets containing a pattern formation material, thereby forming the pattern. A lower limit volume of the droplet is determined based on a width in one direction of the pattern formation region and a contact angle of the droplets with respect to the pattern formation surface, such that a volume of the droplet discharged in the pattern formation region is equal to or greater than the lower limit volume.