Baking apparatus used in photolithography process, and method for controlling critical dimension of photoresist patterns using the same

摘要

A baking apparatus used in a photolithography process of a semiconductor device, and a method for controlling critical dimension of a photoresist pattern using the same. The baking apparatus comprises: a processing chamber; a chuck disposed in the processing chamber on which a semiconductor wafer can be loaded; and a heating means supplying a different temperature of heat by regions of the wafer.