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发明名称
METHOD FOR INCREASING ETCH RESISTANT OF PHOTORESIST
摘要
申请公布号
KR20060081454(A)
申请公布日期
2006.07.13
申请号
KR20050001780
申请日期
2005.01.07
申请人
SAMSUNG ELECTRONICS CO., LTD.
发明人
CHAE, YUN SOOK;MIN, GYUNG JIN;SHIN, CHUL HO
分类号
H01L21/027
主分类号
H01L21/027
代理机构
代理人
主权项
地址
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