发明名称 |
Plasma accelerator system |
摘要 |
A multistage plasma accelerator system includes at least one intermediate electrode between the plasma chamber between electrodes that include each other. An especially good efficiency can be achieved by way of an uneven distribution of potential to the potential stages formed by the plurality of electrodes having a high potential gradient of the last stage, when the plasma beam emerges, and by a special shape of the magnetic field prevailing in the plasma chamber of the last stage.
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申请公布号 |
US7075095(B2) |
申请公布日期 |
2006.07.11 |
申请号 |
US20040494147 |
申请日期 |
2004.11.26 |
申请人 |
THALES ELECTRON DEVICES GMBH |
发明人 |
KORNFELD GUENTER;COUSTOU GREGORY;EMSELLEM GREGORY |
分类号 |
A61N5/00;F03H1/00;H05H1/02;H05H1/54 |
主分类号 |
A61N5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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