发明名称 Apparatus and method for forming thin-film
摘要 A method of forming a thin-film including a capability to remove contaminants from the formed thin-film and/or a substrate on which the thin-film is formed using alcohol. The method includes allowing a substrate holder to support a substract. A first mixture is produced by mixing a condensation polymer containing an element of metal oxide compound and alcohol. Then second mixture is produced by mixing supercritical fluid or liquid carbon dioxide and the first mixture. A thin film is formed by applying the second mixture on a surface of the substrate. After forming the thin-film, the substrate is cleaned by applying alcohol to upper and lower surfaces, preferably the whole upper and lower surfaces, of the substract. The thin-film is crystallized by heating, and the crystallizing may include applying oxygen in a crystallizing chamber. Soft X-rays may be applied to the substrate, during the forming of the thin-film on the surface of the substrate.
申请公布号 US7074548(B2) 申请公布日期 2006.07.11
申请号 US20030376253 申请日期 2003.03.03
申请人 YOUTEC CO., LTD. 发明人 KIJIMA TAKESHI;NATORI EIJI;SUZUKI MITSUHIRO
分类号 B05D3/00;C23C16/455;B01J3/00;B01J19/00;B01J19/12;B01J19/18;B05D1/02;B05D3/06;C08F2/48;C23C18/12;H01L21/31;H01L21/316 主分类号 B05D3/00
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