发明名称 |
Method of selecting pattern to be measured, pattern inspection method, manufacturing method of semiconductor device, program, and pattern inspection apparatus |
摘要 |
A method of selecting a pattern to be measured includes selecting only points from a combination of all factors effecting dimensional fluctuations. For example, fluctuation between wafers, fluctuation in a wafer, and fluctuation in a chip are candidates for measurement points of patterns to be measured. Further, the number of the selected points corresponds to a divisor of the combination of all factors.
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申请公布号 |
US7075098(B2) |
申请公布日期 |
2006.07.11 |
申请号 |
US20030730921 |
申请日期 |
2003.12.10 |
申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
IKEDA TAKAHIRO;KAWAMURA DAISUKE;AOYAMA HISAKO |
分类号 |
G01N21/86;G01N23/225;G01B15/04;G01B21/20;G01N21/95;G01N21/956;H01L21/66 |
主分类号 |
G01N21/86 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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