发明名称 METHOD FOR FORMING SHADOW-MASK PATTERN
摘要 Disclosed is a method of forming a pattern on a mask sheet including an attaching portion to be attached to a mask frame, and a pattern area in which the pattern is formed. The method includes positioning the mask sheet on an auxiliary sheet with a thickness greater than the thickness of the mask sheet, fastening the auxiliary sheet to the mask frame, applying a stretching force to the mask sheet and the auxiliary sheet, and forming the pattern on the pattern area of the mask sheet. Thus, a predetermined pattern is formed on a mask sheet while a uniformly distributed external force is applied to the mask sheet, so that bending or deflecting out of plane by the mask sheet is prevented, thereby forming a precise mask pattern.
申请公布号 KR20060080478(A) 申请公布日期 2006.07.10
申请号 KR20050000960 申请日期 2005.01.05
申请人 SAMSUNG SDI CO., LTD. 发明人 KIM, JIN KYOO;HAN, SANG JIN;KANG, HEE CHEOL;KANG, EU GENE;KIM, TAE HYUNG
分类号 H01J29/07 主分类号 H01J29/07
代理机构 代理人
主权项
地址