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发明名称
METHOD FOR FORMING PLANARIZED INTERMETAL DIELECTRIC FILM OF SEMICONDUCTOR DEVICE
摘要
申请公布号
KR20060079954(A)
申请公布日期
2006.07.07
申请号
KR20050000377
申请日期
2005.01.04
申请人
SAMSUNG ELECTRONICS CO., LTD.
发明人
YUN, SE RAH;HONG, CHANG KI;LEE, JAE DONG
分类号
H01L21/304
主分类号
H01L21/304
代理机构
代理人
主权项
地址
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