发明名称 METHOD FOR PRODUCING CoCrPt-SIO2 SPUTTERING TARGET FOR DEPOSITING MAGNETIC RECORDING FILM
摘要 PROBLEM TO BE SOLVED: To provide a method for producing a CoCrPt-SiO<SB>2</SB>sputtering target with a fine structure for depositing a magnetic recording film applied to a high density magnetic recording medium for a hard disk, particularly, for depositing a CoCrPt-SiO<SB>2</SB>granular magnetic recording film applied to a perpendicular magnetic recording medium. SOLUTION: The method for producing a CoCrPt-SiO<SB>2</SB>sputtering target for depositing a magnetic recording film is provided by which a powdery mixture obtained by mixing Pt powder and fine SiO<SB>2</SB>powder is subjected to calcining treatment thereby producing Pt-SiO<SB>2</SB>calcining-treated powder, and the Pt-SiO<SB>2</SB>calcining-treated powder is blended with Cr powder and Co powder, they are mixed, and the obtained powdery mixture is subjected to pressure sintering. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006176808(A) 申请公布日期 2006.07.06
申请号 JP20040369401 申请日期 2004.12.21
申请人 MITSUBISHI MATERIALS CORP 发明人 NONAKA SOHEI;SHIRAI TAKANORI;SUGIUCHI YUKIYA
分类号 C23C14/34;B22F3/10;C22C19/07;G11B5/851 主分类号 C23C14/34
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