发明名称 CMP POLISHING AGENT FOR ORGANIC MATERIAL AND POLISHING METHOD FOR ORGANIC MATERIAL
摘要 <p><P>PROBLEM TO BE SOLVED: To examine a CMP polishing agent for organic material, polishing a color filter layer to be uniform in thickness in a pixel by selectively polishing a step of the color filter layer to flatten the RGB surface of the color filter layer used in a liquid crystal display and having a high polishing speed. <P>SOLUTION: This CMP polishing agent for organic material contains cerium oxide particles, acrylic ester derivative and water, and preferably the mean particle diameter of the cerium oxide ranges from 0.01 to 20μm. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p>
申请公布号 JP2006175552(A) 申请公布日期 2006.07.06
申请号 JP20040371399 申请日期 2004.12.22
申请人 HITACHI CHEM CO LTD 发明人 UEDA SHUNSUKE;KAMIGATA YASUO
分类号 B24B37/00;C09K3/14 主分类号 B24B37/00
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