Apparatus and method for manufacturing semiconductor device

摘要

An apparatus for manufacturing a semiconductor device performs wet cleaning of a semiconductor wafer in a cleaning chamber, transfer of the wet-cleaned semiconductor wafer into a drying chamber and drying of the semiconductor wafer in the drying chamber. The apparatus includes an atmosphere control means for controlling the atmosphere near the surface of the semiconductor wafer by introducing liquid inert gas onto the surface of the semiconductor wafer which has been wet-cleaned in the cleaning chamber and a transfer means for transferring the semiconductor wafer into the drying chamber in the atmosphere controlled by the atmosphere control means. The atmosphere control means introduces the liquid inert gas such that the surface of the semiconductor wafer is covered with the liquid inert gas and evaporated liquid inert gas.