| 发明名称 |
PLASMA PROCESSING APPARATUS |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To perform uniform processing by generating uniform plasma with microwaves. <P>SOLUTION: A circular rectangular converter 205 is provided between a rectangular waveguide 201 and a cylindrical waveguide 207 which are connected with a microwave feeding device. A dummy load 215 is connected with the cylindrical waveguide 207 between the circular rectangular converter 205 and a circularly-polarized-wave converter 209. The dummy load 215 is a cylinder with a microwave absorber in an end part. A reflector 225 for microwaves is provided in the waveguide between the cylindrical waveguide 207 and the circular rectangular converter 205. An axis of the dummy load 215 is separated from the reflector 225 toward the circularly-polarized-wave converter 209 only by 1/4 wave length L of guide wave length of a stationary wave reflected by the reflector 225. Thereby, the microwaves reflected by a radial waveguide box 211 can be effectively absorbed by the dummy load 215. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
| 申请公布号 |
JP2006179477(A) |
申请公布日期 |
2006.07.06 |
| 申请号 |
JP20050342527 |
申请日期 |
2005.11.28 |
| 申请人 |
TOKYO ELECTRON LTD;YASAKA YASUNORI;ANDO MAKOTO;NIHON KOSHUHA CO LTD |
发明人 |
ISHII NOBUO;YASAKA YASUNORI;SHINOHARA KIBATSU |
| 分类号 |
H05H1/46;C23C16/511;H01L21/205;H01L21/304;H01L21/3065 |
主分类号 |
H05H1/46 |
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