| 摘要 |
PROBLEM TO BE SOLVED: To provide a compound usable for the production of an insulating film having finer voids in the case of forming a porous film having excellent properties as an insulating film for electronic parts. SOLUTION: The compound is expressed by formula (1): R<SP>1</SP>-R-R<SP>2</SP>. In the formula, R<SP>1</SP>- and R<SP>2</SP>- are each expressed by formula (2); R<SP>1A</SP>, R<SP>1B</SP>, R<SP>1C</SP>, R<SP>2A</SP>, R<SP>2B</SP>and R<SP>2C</SP>are each independently a 1-20C univalent hydrocarbon group or a hydrogen atom; at least one of R<SP>1A</SP>, R<SP>1B</SP>and R<SP>1C</SP>is a 1-20C hydrocarbon group having an aromatic ring; at least one of R<SP>2A</SP>, R<SP>2B</SP>and R<SP>2C</SP>is a 1-20C hydrocarbon group having an aromatic group; and R is a 1-10C bivalent saturated hydrocarbon group. COPYRIGHT: (C)2006,JPO&NCIPI
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