| 摘要 |
A lithographic apparatus includes a support structure configured to hold a phase shift mask, the phase shift mask configured to pattern a beam of unpolarized radiation according to a desired pattern and a substrate table configured to hold a substrate. The lithographic apparatus also includes a projection system configured to project the patterned beam onto a target portion of the substrate on which a negative resist layer is deposited to form an image of the pattern on the negative resist layer.
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