Method for determining distribution of component e.g. soluble component in volume of photoresist involves post baking process which is followed on lithographic exposure whereby lower parts of photoresist volume in cells

摘要

The method involves post baking process which is followed on lithographic exposure whereby lower parts of photoresist volume in cells (1) and setting up of a chemical master equation (2) for reaction diffusion system which express stochastic kinetics of chemical reactions in the cells and diffusion procedures between the cells of photoresist volume in post baking process. Dismantling of chemical master equation (3) on the basis of a Gillespie algorithm for a given post baking time, in order to determine the distribution of the component in the photoresist volume after procedure of given post-baking time. An independent claim is also include for method of determining edge profile of volume of photoresist.