PLASMA PROCESSING APPARATUS

摘要

A dry etching apparatus (11) is provided with a vacuum container (12) wherein an object (1) to be processed is arranged on a bottom wall side in an internal space (15); a plasma generating coil (36), which is arranged on an outer side upper part of the vacuum container (12) and is provided with a conductor (37) arranged to form a space (39A) in a plane view; a top wall (16), which closes an upper part of the internal space (15) and is provided with a transparent section (30) at a position corresponding to the space (39A) between the conductors (37) of the coil (36) in the plane view; and a camera (45), which is arranged at the upper part of the coil (36) and includes at least a part of the object in a view field through the space (39A) and the transparent section (30). The status of the object during plasma processing can be observed in real time.