发明名称 |
SEMICONDUCTOR MANUFACTURING APPARATUS, ABNORMALITY DETECTION IN SUCH SEMICONDUCTOR MANUFACTURING APPARATUS, METHOD FOR SPECIFYING ABNORMALITY CAUSE OR PREDICTING ABNORMALITY, AND RECORDING MEDIUM WHEREIN COMPUTER PROGRAM FOR EXECUTING SUCH METHOD IS |
摘要 |
<p>A two-axis coordinate system, in which two parameters to be monitored selected from a plurality of apparatus status parameters indicating a status of a semiconductor manufacturing apparatus are allocated to a first axis and a second axis, respectively, is prepared so as to detect an abnormality of the semiconductor manufacturing apparatus. As the parameters to be monitored, for example, a cumulative film thickness of a film forming process performed in the past by a film forming apparatus, and an open degree of a pressure adjusting valve provided in a vacuum exhaust path for controlling the pressure in a reactor vessel are selected. A value of the parameter to be monitored, which was obtained while the semiconductor manufacturing apparatus was normally operating in the past, is plotted on the two-axis coordinate system. A boundary between a normal status and an abnormal status is set around a plot group. A value of the parameter to be monitored, which is obtained while the semiconductor manufacturing apparatus is currently operating, is plotted on the two-axis coordinate system, and based on a positional relationship between the plot and the boundary, whether an abnormality is generated or not and a type of the abnormality are specified.</p> |
申请公布号 |
WO2006070689(A1) |
申请公布日期 |
2006.07.06 |
申请号 |
WO2005JP23617 |
申请日期 |
2005.12.22 |
申请人 |
SAKAMOTO, KOICHI;TOKYO ELECTRON LIMITED;OBATA, MINORU;KOYAMA, NORIAKI |
发明人 |
SAKAMOTO, KOICHI;OBATA, MINORU;KOYAMA, NORIAKI |
分类号 |
H01L21/205;C23C16/44 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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