| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a seamless mask structure which allows designing a continuous pattern in which small and large images such as dots and solid patterns are mixed and ensures high durability, with respect to a cylindrical seamless mask. <P>SOLUTION: The cylindrical mask structure comprises a continuous cylindrical substrate which is substantially transparent to an actinic ray and a mask material disposed on a substrate surface in a seamless state. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
